HAUS LABS
Triclone™ Skin Tech Foundation
$52★ 4.7271 reviews
An award-winning, medium buildable coverage, high-performance, clean foundation infused with our proprietary fermented arnica that helps reduce redness, helps even skin tone and protects from environmental stress. Suitable for all skin types including sensitive and acne-prone.
Ingredients
19 in this formula · tap any to learn more
- 01Aqua (Water
- 02Eau)
- 03Diphenylsiloxy Phenyl Trimethicone
- 04Phenyl Trimethicone
- 05Caprylyl Methicone
- 06Trimethylsiloxysilicate
- 07Propylene Glycol Dibenzoate
- 08Isododecane
- 09Glycerin
- 10Butylene Glycol
- 11Methyl Trimethicone
- 12Lauryl Polyglyceryl-3 Polydimethylsiloxyethyl Dimethicone
- 13C13-15 Alkane
- 14Polymethylsilsesquioxane
- 15Polyglyceryl-3 Polydimethylsiloxyethyl Dimethicone
- 16Alcohol Denat
- 17Acrylates/Polytrimethylsiloxymethacrylate Copolymer
- 18Sorbitan Sesquioleate
- 19Disteardimonium Hectorite
Reviews
No product reviews yet — check the community for early chatter.